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Brand Name : Hoan
Package Type : Die form
Certification : ISO 9001:2015, RoHS, REACH
Gate Material : Polysilicon
Breakdown Voltage : 10 V
Substrate Doping Concentration : 1e15 cm^-3
Place of Origin : Shannxi,China
Gate Width : 10 µm
Oxide Thickness : 10 nm
Dielectric Material : Silicon Dioxide (SiO2)
Model Number : HACC-CUSTOM-ES
Frequency Range : 1 kHz to 1 MHz
Operating Voltage : 0 - 5 V
Delivery Time : 5-7 working days prototype
MOQ : 10 Pieces
Substrate Type : P-type Silicon
Payment Terms : L/C,D/A,D/P,T/T,
Leakage Current : 1 nA
Capacitance : 1 pF
Temperature Range : -40°C to 125°C
Gate Length : 1 µm
Interface Trap Density : 1e10 cm^-2 eV^-1
Multi-gigabit SERDES (Serializer/Deserializer) DC blocking capacitors face stringent equivalent series resistance (ESR) requirements. At 10 Gbps and beyond, even 0.1 Ohm of ESR contributes to insertion loss, eye closure, and deterministic jitter. The HACC-CUSTOM-ES achieves ESR <0.05 Ohm at 10 GHz and <0.02 Ohm at 40 GHz through three concurrent design optimizations:
ESR is verified per frequency band: <0.05 Ohm from 1–10 GHz, <0.1 Ohm from 10–20 GHz, and <0.15 Ohm from 20–40 GHz — providing designers with guaranteed ESR margins for their specific SERDES data rate.
High-speed serial link tuning requires precise capacitance values — not just within a tolerance band, but at the exact value optimized through simulation. The HACC-CUSTOM-ES offers capacitance step of 1 pF minimum increment with laser-trimmable resolution to 0.1 pF, achieving ±2% of the target value. Available in a fine-step series (1p, 2p, 3p, 5p, 7p, 10p, 15p, 22p, 33p, 47p, 68p, 100p) from 0.5 pF to 1000 pF. Each die undergoes in-situ capacitance measurement with closed-loop laser trim feedback, and S-parameter verification post-trim confirms the capacitance value in the actual RF environment — not just at 1 MHz LCR meter frequency.
Wire bond reliability in high-speed assemblies is determined by the top metallization quality. The HACC-CUSTOM-ES features 3µm thick gold surface metallization with <50 nm Ra surface roughness and controlled grain structure — achieving pull strength exceeding 3.0 g on both 25µm and 18µm wire diameters, compatible with both wedge and ball bonding processes. The controlled surface minimizes bond deformation variability and ensures consistent electrical contact impedance across all bonds in a multi-die module.
| Parameter | Value |
|---|---|
| ESR at 10 GHz | <0.05 Ohm |
| ESR at 40 GHz | <0.02 Ohm |
| Capacitance Step | 1 pF min, 0.1 pF laser trim resolution |
| Capacitance Range | 0.5 pF–1000 pF fine-step series |
| Top Electrode | TiW-Au 3–5µm thick |
| Surface Roughness | <50 nm Ra Au |
| Wire Bond Pull Strength | >3.0 g (25µm & 18µm wire) |
| Q Factor | ≥50 at 10 GHz, ≥30 at 40 GHz |
| SRF | >20 GHz typical |
| Operating Temperature | -55°C to +125°C |
Contact us with your target ESR, capacitance value, and wire bond requirements. Custom ultra-low ESR MOS capacitors with precision step tuning ship in 5–7 business days.
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